SYNTHESIS OF ALUMINIUM DOPED ZINC SELENIDE (ZnSe:Al )THIN FILMS USING CHEMICAL BATH DEPOSITION TECHNIQUE

Authors

  • Isi, P.O. Department of Physics and Industrial Physics, Nnamdi Azikiwe University, Awka, Anambra State. Nigeria
  • Emumejaye, K. Department of Physics, Delta State University of Science and Technology, Ozoro. Nigeria
  • Ibe, C.S. Department of Physics and Industrial Physics, Nnamdi Azikiwe University, Awka, Anambra State. Nigeria
  • Isah, J. Department of Physics, University of Abuja. Nigeria
  • Uzor, C.E. Department of Physics and Industrial Physics, Nnamdi Azikiwe University, Awka, Anambra State. Nigeria
  • Ikenga, O.A. Department of Physics and Industrial Physics, Nnamdi Azikiwe University, Awka, Anambra State. Nigeria
  • Muomeliri, C.B. Department of Physics and Industrial Physics, Nnamdi Azikiwe University, Awka, Anambra State. Nigeria
  • Aribodor D.N. Department of Parasitology and Entomology, Nnamdi Azikiwe University, Awka, Anambra State. Nigeria

Keywords:

Aluminium-doped Zinc Selenide (ZnSe:Al), Chemical bath, Thin films, Optical characteristics, X-ray diffraction

Abstract

Aluminium-doped zinc selenide (ZnSe:Al) thin films were synthesized using the chemical bath deposition technique. Their optical characteristics were examined with a Cary 300 UV–Visible spectrophotometer over the 200–800 nm wavelength range at normal incidence. Absorbance data obtained from the spectrophotometer were used to compute and plot the corresponding transmittance and reflectance spectra. Structural properties were analyzed using a Rigaku Miniflex 630 X-ray diffractometer, while elemental composition was investigated with a JEOL JSM-7600F system. The deposited films exhibited strong absorption in the UV region and relatively weak absorption within the visible range. Surface morphology revealed that increasing aluminum concentration influences grain size, whereas structural analysis indicated that higher Al doping levels progressively suppress the crystalline nature of the films. This indicates that the deposited films are suitability for UV-blocking or optoelectronic applications.

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Published

2025-10-31